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ITAB IV – International TECHstyle Art Biennial
ITAB IV, the fourth installment of International TECHstyle Art Biennial, SJMQT’s signature juried exhibition, focuses on works by artists who merge fiber media with new information and communication technologies. Clay Bavor, Janet Echelman and Nathalie Miebach juried the exhibition. Leveraging its location in Silicon Valley, ITAB serves as the premiere platform for introducing works exploring the intersection of textiles and technology to a global community. This year, twenty-three artists were selected by the jurors to take part in ITAB’s fourth edition. Works by artists combine fiber media with diverse artistic disciplines such as architecture, installation art, interior design, new media, and sculpture. SDA artists participating in the exhibition include: Marie Bergstedt, Eszter Bornemisza, Lia Cook, June Lee, Janice Lessman-Moss,Teddy Milder, Erin Miller and Ruth Tabancay. Artist walk-through and opening reception January 20, 2019, 2-5 pm.
Image: Teddy Milder, “Data Security…?” detail, 2018, 27″ x 36″ x 14.5″, 2000 ft. of handmade digitally-printed silk ribbon; cane; waxed linen; found rusted crate
San Jose Museum of Quilt and Textiles
San Jose, California United States